TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...
A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by Lawrence Livermore National Laboratory (LLNL), the project aims for ...
A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. “For higher computing power of ...
China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They had a semiconductor Manhattan Project”. The prototype was completed in early ...
A new technical paper titled “Directed self-assembly of block copolymers for high-precision patterning in the era of extreme ultraviolet lithography” was published by researchers at University of ...
New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...
Then at Intel's Foundry Direct event in April, Intel's chief technology and operations officer Naga Chandrasekaran stated ...
Steven Scheer: "The opening of the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands, marked a milestone in preparing High NA EUV for adoption in mass manufacturing [1].
Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that he claims is superior to the method currently ...
Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for ...
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