San Jose, Calif. – New tools based on electron-beam and nanomachining technologies are coming to the mask repair market, complementing traditional tools based on focused ion beams and lasers . Vendors ...
The new high-throughput maskless tool developed at DARPA, achieves high throughput through the simultaneous deployment of 1 million parallel electron beamlets. Illustration: DARPA DARPA said its ...
The multiple-beam electron-beam market is going in two separate directions at once. Multi-beam for photomask writing is set to take off. The other market–multi-beam for direct-write lithography ...
EAST FISHKILL, N.Y. — NuFlare Technology Inc.–the electron-beam reticle-writing tool unit of Toshiba Machine Corp.–is readying its next-generation machine for the development of advanced photomasks ...
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