OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...
In the realm of science and technology, harnessing coherent light sources in the deep ultraviolet (DUV) region holds immense significance across various applications such as lithography, defect ...
Gigaphoton, the Japanese company that provides excimer lasers for semiconductor lithography applications, says it will double production capacity of the light sources by 2023. The decision comes in ...
This study is led by Dr. Fangjun Wang, Dr. Chunlei Xiao, and Dr. Gao Li from Dalian Institute of Chemical Physics, the Chinese Academy of Sciences. Fangjun Wang and Chunlei Xiao cooperated to build a ...
TOKYO — Gearing up for the production of its new 193-nm lithography tools, Japan's Nikon Corp. here has received the first in a new line of argon-fluoride (ArF) excimer light sources from Cymer Inc.
Introduction of the breakthrough "s" series features, extending DUV light source performance, enhancing availability and reducing operating costs. SPIE Advanced Lithography 2012 - OYAMA, ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results